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Machine Learning-Based Modelling in Atomic Layer Deposition Processes - Oluwatobi Adeleke - Bog

Bag om Machine Learning-Based Modelling in Atomic Layer Deposition Processes

This book describes the application of machine learning modelling approaches in atomic layer deposition and presents detailed information on modelling, optimization, and prediction of the behaviour and characteristics of ALD for improved process quality control.

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  • Sprog:
  • Ukendt
  • ISBN:
  • 9781032386706
  • Indbinding:
  • Hardback
  • Sideantal:
  • 354
  • Udgivet:
  • 15. december 2023
  • Størrelse:
  • 156x0x234 mm.
  • Vægt:
  • 852 g.
  • 8-11 hverdage.
  • 4. december 2024
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Prøv i 30 dage for 45 kr.
Herefter fra 79 kr./md. Ingen binding.

Beskrivelse af Machine Learning-Based Modelling in Atomic Layer Deposition Processes

This book describes the application of machine learning modelling approaches in atomic layer deposition and presents detailed information on modelling, optimization, and prediction of the behaviour and characteristics of ALD for improved process quality control.

Brugerbedømmelser af Machine Learning-Based Modelling in Atomic Layer Deposition Processes



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