Name: Machine Learning-Based Modelling in Atomic Layer Deposition Processes
Price: 2036.95 DKK
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Author: Oluwatobi Adeleke
ISBN: 9781032386706

Machine Learning-Based Modelling in Atomic Layer Deposition Processes af Oluwatobi Adeleke

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This book describes the application of machine learning modelling approaches in atomic layer deposition and presents detailed information on modelling, optimization, and prediction of the behaviour and characteristics of ALD for improved process quality control.

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Sprog:
Ukendt

ISBN:
9781032386706

Forlag:
Taylor & Francis Ltd

Indbinding:
Hardback

Sideantal:
354

Udgivet:
15. december 2023

Størrelse:
156x0x234 mm.

Vægt:
852 g.

Leveringstid: 8-11 hverdage.
Forventet levering: 15. januar 2025

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Forlænget returret til d. 31. januar 2025

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This book describes the application of machine learning modelling approaches in atomic layer deposition and presents detailed information on modelling, optimization, and prediction of the behaviour and characteristics of ALD for improved process quality control.

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