Bøger i Springer Series in Surface Sciences serien

This book provides a comprehensive introduction to the methods and variety of Kelvin probe force microscopy, including technical details. It also offers an overview of the recent developments and numerous applications, ranging from semiconductor materials, nanostructures and devices to sub-molecular and atomic scale electrostatics.In the last 25 years, Kelvin probe force microscopy has developed from a specialized technique applied by a few scanning probe microscopy experts into a tool used by numerous research and development groups around the globe. This sequel to the editors' previous volume "Kelvin Probe Force Microscopy: Measuring and Compensating Electrostatic Forces," presents new and complementary topics.It is intended for a broad readership, from undergraduate students to lab technicians and scanning probe microscopy experts who are new to the field.

This book focuses on surface activity of electron emission (EE). Prior to protective painting, a steel surface is usually grit blasted or sandblasted to remove scale and contaminants and to roughen the surface. This book emphasizes that such surface treatment causes EE, increasing the strength of paint adhesion. Introduced here are the experimental results of thermally assisted photoelectron emission (TAPE) and tribo-stimulated (rubbing) electron emission (TriboEE) from practical metals after different kinds of surface-treatment processes. A detailed description is given of how Arrhenius activation energies relating to electron transfer through the surface overlayer and also the energy levels of electrons trapped in the overlayer can be obtained, and how TAPE and TriboEE data can be influenced by the chemical properties of that overlayer. This book is composed of four parts: I. Surface treatment processes; II. The principle of EE analysis used for practical surfaces; III. Materials and methods of EE and X-ray photoelectron spectroscopy (XPS); IV. EE and XPS characteristics of practical surfaces. In the last part, the EE and XPS results for metals, semiconductors, and carbon materials are drawn from the author's own publications. The book will be useful for researchers engaging in surface-treatment processes of various materials.

Scanning tunnelling microscopy (STM) is a powerful technique for surface analysis with atomic resolution. The book appeals to researchers, advanced students and analysts in industrial laboratories.

This second edition provides a cutting-edge overview of physical, technical and scientific aspects related to the widely used analytical method of confocal Raman microscopy.

This book gives a representative survey of the state of the art of research on gas-surface interactions. The book presents how modern surface science targets the atomic-level understanding of physical and chemical processes at surfaces, with particular emphasis on dynamical aspects.

This book is an up-to-date survey of the major optical characterization techniques for thin solid films. Relevant fundamentals are briefly reviewed before demonstrating the application of these techniques to practically relevant research and development topics.

This book provides the first complete and up-to-date summary of the state of the art in HAXPES and motivates readers to harness its powerful capabilities in their own research. In consideration of the rapid development of the technique, several chapters include highlights illustrating future opportunities as well.

This book provides a comprehensive introduction to the methods and variety of Kelvin probe force microscopy, including technical details. It also offers an overview of the recent developments and numerous applications, ranging from semiconductor materials, nanostructures and devices to sub-molecular and atomic scale electrostatics.In the last 25 years, Kelvin probe force microscopy has developed from a specialized technique applied by a few scanning probe microscopy experts into a tool used by numerous research and development groups around the globe. This sequel to the editors¿ previous volume ¿Kelvin Probe Force Microscopy: Measuring and Compensating Electrostatic Forces,¿ presents new and complementary topics.It is intended for a broad readership, from undergraduate students to lab technicians and scanning probe microscopy experts who are new to the field.

This second edition provides a cutting-edge overview of physical, technical and scientific aspects related to the widely used analytical method of confocal Raman microscopy.

This book is an up-to-date survey of the major optical characterization techniques for thin solid films. Relevant fundamentals are briefly reviewed before demonstrating the application of these techniques to practically relevant research and development topics.

This book presents the basics of Auger- and X-Ray Photoelectron Spectroscopy in Materials Science in logical order from sample preparation and instrument setup through data acquisition to data evaluation. Offers guidance on problem-solving and worked examples.

This is the first ever comprehensive treatment of NEXAFS spectroscopy. It is suitable for novice researchers as an introduction to the field, while experts will welcome the detailed description of state-of-the-art instrumentation and analysis techniques, along with the latest experimental and theoretical results.

This book presents developments of techniques for detection and analysis of two electrons resulting from the interaction of a single incident electron with a solid surface.

This new edition provides a state-of-the-art survey of ellipsometric methods used to study organic films and surfaces, from laboratory to synchrotron applications, with a special focus on in-situ use in processing environments and at solid-liquid interfaces.

This new edition provides a state-of-the-art survey of ellipsometric methods used to study organic films and surfaces, from laboratory to synchrotron applications, with a special focus on in-situ use in processing environments and at solid-liquid interfaces.

This comprehensive work on pulsed laser ablation explicitly links the principles and methodology to the physical properties of the irradiated materials. From the basics to the most advanced topics, it incorporates the latest theory and experimental data.

As well as coverage of the base concepts in thin film theory, this volume has details of many of the latest results in the field, including materials mixtures and nanostructured coatings. It includes dedicated software packages for materials characterization.

Micro-X-ray fluorescence offers the possibility for a position- sensitive and non-destructive analysis that can be used for the analysis of non-homogeneous materials and layer systems.