Udvidet returret til d. 31. januar 2025

Handbook of Advanced Semiconductor Technology and Computer Systems - Guy Rabbat - Bog

Bag om Handbook of Advanced Semiconductor Technology and Computer Systems

Plasma enhanced chemical vapor deposition (PECVD) is a technique widely accepted in microelectronics for the deposition of amorphous dielectric films such as silicon nitride and silicon oxide. Batch etching reactors and etching processes are approaching ma turity after more than ten years of development.

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  • Sprog:
  • Engelsk
  • ISBN:
  • 9789401170581
  • Indbinding:
  • Paperback
  • Sideantal:
  • 942
  • Udgivet:
  • 24. juni 2012
  • Udgave:
  • 11988
  • Størrelse:
  • 155x235x48 mm.
  • Vægt:
  • 1442 g.
  • 8-11 hverdage.
  • 13. december 2024
Forlænget returret til d. 31. januar 2025

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Beskrivelse af Handbook of Advanced Semiconductor Technology and Computer Systems

Plasma enhanced chemical vapor deposition (PECVD) is a technique widely accepted in microelectronics for the deposition of amorphous dielectric films such as silicon nitride and silicon oxide. Batch etching reactors and etching processes are approaching ma turity after more than ten years of development.

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