Plasma Sources for Thin Film Deposition and Etching

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Hardback
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852,95 kr.

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Includes four chapters that discuss high-density plasma sources for materials processing, electron cyclotron resonance and its uses, unbalanced magnetron sputtering, and particle formation in thin film processing plasma.

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Sprog:
Engelsk

ISBN:
9780125330183

Forlag:
Elsevier Science Publishing Co Inc

Indbinding:
Hardback

Sideantal:
328

Udgivet:
29. september 1994

Størrelse:
236x158x27 mm.

Vægt:
642 g.

Leveringstid: 2-3 uger.
Forventet levering: 21. januar 2025

Forlænget returret til d. 31. januar 2025

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Beskrivelse af Plasma Sources for Thin Film Deposition and Etching

Includes four chapters that discuss high-density plasma sources for materials processing, electron cyclotron resonance and its uses, unbalanced magnetron sputtering, and particle formation in thin film processing plasma.

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