Name: Simulation of Deposition Processes with PECVD Apparatus
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Author: Juergen Geiser
ISBN: 9781621003656

Simulation of Deposition Processes with PECVD Apparatus af Juergen Geiser

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Discusses the study of simulating the growth of a thin film by chemical vapour deposition (CVD) processes. This title presents underlying hierarchy of models for low-temperature and low-pressure plasma in order to discuss the processes that can be used to implant or deposit thin layers of important materials.

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Sprog:
Engelsk

ISBN:
9781621003656

Forlag:
Nova Science Publishers Inc

Indbinding:
Hardback

Sideantal:
144

Udgivet:
1. januar 2012

Størrelse:
162x234x14 mm.

Vægt:
352 g.

Leveringstid: Ukendt - mangler pt..

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Discusses the study of simulating the growth of a thin film by chemical vapour deposition (CVD) processes. This title presents underlying hierarchy of models for low-temperature and low-pressure plasma in order to discuss the processes that can be used to implant or deposit thin layers of important materials.

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