Vi bøger
Levering: 1 - 2 hverdage

Handbook of Chemical Vapor Deposition - Hugh O. (Sandia National Laboratories (retired)) Pierson - Bog

- Principles, Technology and Applications

Bag om Handbook of Chemical Vapor Deposition

Offers an understanding of the advances in the Chemical Vapor Deposition (CVD) process. This book features data on both Plasma CVD and metallo-organic CVD processes. It also explains growing importance of CVD in production of semiconductor and related applications.

Vis mere
  • Sprog:
  • Engelsk
  • ISBN:
  • 9780815514329
  • Indbinding:
  • Hardback
  • Sideantal:
  • 506
  • Udgivet:
  • 1. September 1999
  • Udgave:
  • 2
  • Størrelse:
  • 164x237x40 mm.
  • Vægt:
  • 944 g.
  • 8-11 hverdage.
  • 16. Oktober 2024

Normalpris

Medlemspris

Prøv i 30 dage for 45 kr.
Herefter fra 79 kr./md. Ingen binding.

Beskrivelse af Handbook of Chemical Vapor Deposition

Offers an understanding of the advances in the Chemical Vapor Deposition (CVD) process. This book features data on both Plasma CVD and metallo-organic CVD processes. It also explains growing importance of CVD in production of semiconductor and related applications.

Brugerbedømmelser af Handbook of Chemical Vapor Deposition



Find lignende bøger
Bogen Handbook of Chemical Vapor Deposition findes i følgende kategorier:

Gør som tusindvis af andre bogelskere

Tilmeld dig nyhedsbrevet og få gode tilbud og inspiration til din næste læsning.