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Optical and EUV Lithography - Andreas Erdmann - Bog

- A Modeling Perspective

Bag om Optical and EUV Lithography

Introduces interested students with backgrounds in physics, optics, computational engineering, mathematics, chemistry, material science, nanotechnology, and other areas to the fascinating field of lithographic techniques for nanofabrication. It should also help senior engineers and managers expand their knowledge of alternative methods and applications.

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  • Sprog:
  • Engelsk
  • ISBN:
  • 9781510639010
  • Indbinding:
  • Paperback
  • Sideantal:
  • 374
  • Udgivet:
  • 30. April 2021
  • Størrelse:
  • 255x178x24 mm.
  • Vægt:
  • 682 g.
  • Ukendt - mangler pt..

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Medlemspris

Prøv i 30 dage for 45 kr.
Herefter fra 79 kr./md. Ingen binding.

Beskrivelse af Optical and EUV Lithography

Introduces interested students with backgrounds in physics, optics, computational engineering, mathematics, chemistry, material science, nanotechnology, and other areas to the fascinating field of lithographic techniques for nanofabrication. It should also help senior engineers and managers expand their knowledge of alternative methods and applications.

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