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Low-Energy Ion Irradiation of Materials - Bernd Rauschenbach - Bog

Bag om Low-Energy Ion Irradiation of Materials

This book provides a comprehensive introduction to all aspects of low-energy ion¿solid interaction from basic principles to advanced applications in materials science. It features a balanced and insightful approach to the fundamentals of the low-energy ion¿solid surface interaction, focusing on relevant topics such as interaction potentials, kinetics of binary collisions, ion range, radiation damages, and sputtering. Additionally, the book incorporates key updates reflecting the latest relevant results of modern research on topics such as topography evolution and thin-film deposition under ion bombardment, ion beam figuring and smoothing, generation of nanostructures, and ion beam-controlled glancing angle deposition. Filling a gap of almost 20 years of relevant research activity, this book offers a wealth of information and up-to-date results for graduate students, academic researchers, and industrial scientists working in these areas.

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  • Sprog:
  • Engelsk
  • ISBN:
  • 9783030972790
  • Indbinding:
  • Paperback
  • Sideantal:
  • 780
  • Udgivet:
  • 21. august 2023
  • Udgave:
  • 23001
  • Størrelse:
  • 155x42x235 mm.
  • Vægt:
  • 1159 g.
  • 8-11 hverdage.
  • 3. december 2024
På lager

Normalpris

  • BLACK NOVEMBER

Medlemspris

Prøv i 30 dage for 45 kr.
Herefter fra 79 kr./md. Ingen binding.

Beskrivelse af Low-Energy Ion Irradiation of Materials

This book provides a comprehensive introduction to all aspects of low-energy ion¿solid interaction from basic principles to advanced applications in materials science. It features a balanced and insightful approach to the fundamentals of the low-energy ion¿solid surface interaction, focusing on relevant topics such as interaction potentials, kinetics of binary collisions, ion range, radiation damages, and sputtering. Additionally, the book incorporates key updates reflecting the latest relevant results of modern research on topics such as topography evolution and thin-film deposition under ion bombardment, ion beam figuring and smoothing, generation of nanostructures, and ion beam-controlled glancing angle deposition. Filling a gap of almost 20 years of relevant research activity, this book offers a wealth of information and up-to-date results for graduate students, academic researchers, and industrial scientists working in these areas.

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